Room 322

Magnetron sputtering (CEVP Gamma 1000C)

Wafer bonding system (FINE PLACER 96Lamda)

Thermal evaporation

Thermal evaporation

Thermal evaporation

DI water

Mask Aligner (Suss MJB4)

Nanoimprint (Obducat )

Centrifuge

Optical microscope (Olympus BX51M)

ICP etching

 

 

 

Room 325

Microscope (Carl Zeiss Axio Imager A2m)

Optical fiber fusion splicer (Fujikura FSM-30S) 

Ti sapphire pico-second laser (coherent)
 

Microzone confocal Raman spectroscope (HORIBA Jobin Yvon, LabRam HR 800)

Semiconductor Characterization System (Keithley 4200)

Computer controlled source meter (Keithley 2400)
 

Fiber spectrometer (Horiba Triax 320)

Cold trap

Step profiler (Veeco Dektak150)

Solar simulator (Newport)

Transient spectrometer (Edinburgh Instruments FLS920 )

Room 366

Low pressure tube furnace

Tube furnace

Tube furnace

Tube furnace

 

Room 458

Hall measurement system (Accent HL5500)

Wafer lifetime tool