Research Interest
Explore new physics and new functionality of low dimensional electronic materials by controllably tuning disorders, functional groups and their interactions with the charge and spin carriers of the materials while probing their electronic transport properties in-situ. A wide range of materials, including but not limited to, graphene, topological insulator thin films and ultra thin transition metal dichalcogenides, are suitable for such in-situ manipulation and electronic transport studies.
2D Dirac Semimetal: Graphene
2D semiconductors and semimetals: Transition Metal Dichalcogenides, Black Phosphors
Ultra-thin Weyl Semimetal: TaP, TaAs
Main Experimental Apparatus
Device Fabrication-
E-beam Lithography System
FEI nanolab + Nabity NPGS system, Room 203, East Physics Building.
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Thermal and E-beam Evaporator
Room 202, East Physics Building.
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UHV Thermal and E-beam Evaporator
Room 407, East Physics Building.
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Mask Aligner
Room 202, East Physics Building.
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ME-3A Reactive Ion Etching
Room 202, East Physics Building.
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Glove Box
Room 407, East Physics Building.
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9T In-situ Transport Measurement System
Room 407, East Physics Building.
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PPMS
Room 403, East Physics Building. In collaboration with Prof. Jing Shi and Prof Wei Han.
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PPMS
Room B264, West Physics Building.
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Bruker AFM
Room 202, East Physics Building.
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Probe Station
Room 407, East Physics Building.
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MPMS
Room B264, West Physics Building.
Instrumentation Plan
SYSTEM 1: fast turnaround, high through-put. (project completed, see Main Experimental Apparatus)
SPECS: sample in UHV; temperature range from 4K to 450K; magnetic field of up to 9T, with tunable samplemagnetic field angle; multiple in-situ surface (bulk) manipulation schemes on electrically addressed samples from 4K to 450K.
SUBSYSTEM: Vibration-damped closed-cycle variable temperature sample probe (UHV compatible)
SYSTEM 2: low T, high stability, large magnetic field
SPECS: sample in UHV; temperature range from 0.3K to 450K; magnetic field of up to 14T, with tunable samplemagnetic field angle; multiple in-situ surface (bulk) manipulation schemes on electrically addressed samples from 4K to 450K.